ROUND LAB

ROUND LAB: Pine Calming Cica Mask `10 sheets

(14 reviews)

Round Lab Pine Calming Cica Mask Sheet softens, hydrates, and soothes the skin, reducing irritation and redness. It helps restore skin after exposure to wind, sun, temperature changes, and environmental stressors.

  • Softens rough and irritated skin, instantly refreshes, reduces inflammation, and provides comfort.

  • Hypoallergenic formula suitable for sensitive skin.

Key Active Ingredient – Pine Cica Activer Complex:

  • Pine Extract: Sourced from plants grown in Yangyang County, Gangwon Province, Korea, extracted using low-temperature methods to preserve nutrients. Pine provides anti-inflammatory and antioxidant benefits.

  • Centella Complex: Includes Centella Asiatica extract, asiaticoside, asiatic acid, madecassoside, and madecassic acid. Supports barrier function, strengthens blood vessel walls, prevents couperose, and improves skin elasticity.

  • Glycoproteins: Strengthen the skin’s natural barrier and increase overall hydration.

Additional Active Ingredients:

  • LHA (Capryloyl Salicylic Acid): A gentle BHA alternative with larger molecules that delicately dissolve impurities, brighten sebum plugs, and prevent blackheads.

  • Portulaca Extract: Speeds up regeneration and healing, tightens pores, and regulates sebum production.

  • 3 Types of Hyaluronic Acid: Penetrate deep into the epidermis, actively hydrate cells, and lock in moisture with a protective barrier.

  • Irish Moss Extract (Carrageenan): Powerful antioxidant that protects cells from free radical damage, prolongs skin youthfulness, and enhances barrier function.

Suitable for: All skin types.

How to Use: After cleansing and toning, apply the mask to your face. Remove after 15–20 minutes and gently pat the remaining essence into the skin.

라운드랩: 소나무 진정 시카 마스크